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Please use this identifier to cite or link to this item: http://dspace.bits-pilani.ac.in:8080/jspui/handle/123456789/10132
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dc.contributor.authorKumar, Rahul-
dc.date.accessioned2023-04-03T08:49:59Z-
dc.date.available2023-04-03T08:49:59Z-
dc.date.issued2017-03-
dc.identifier.urihttps://ieeexplore.ieee.org/document/7805266-
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/10132-
dc.description.abstractA new and exciting resistive gas sensor based on Ni/InGaN/GaN heterostructure, grown by plasma-assisted molecular beam epitaxy, has been developed to efficiently detect acetone very rapidly at low temperature. Non-rectifying I-V characteristics of epitaxially relaxed InGaN with Ni contact have been revealed at 373 K. An incremental current of 11.74 μA has been found at 373 K with the exposure of 100 ppm of acetone vapor at an operating bias of 0.4 V. Sensitivity has been obtained from transient response curves. Most importantly, very fast response/recovery characteristics with good baseline recovery have been witnessed. The response time and recovery time have been found to be ~7.6-8.4 s and ~4.5-19.1 s. A possible explanation, including Langmuir adsorption-desorption isotherm, has also been discussed.en_US
dc.language.isoenen_US
dc.publisherIEEEen_US
dc.subjectEEEen_US
dc.subjectFast responseen_US
dc.subjectAcetone sensoren_US
dc.subjectInGaN/GaNen_US
dc.subjectResistive deviceen_US
dc.titleFast Response (7.6s) Acetone Sensing by InGaN/GaN on Si (111) at 373 Ken_US
dc.typeArticleen_US
Appears in Collections:Department of Electrical and Electronics Engineering

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