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Please use this identifier to cite or link to this item: http://dspace.bits-pilani.ac.in:8080/jspui/xmlui/handle/123456789/10138
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dc.contributor.authorKumar, Rahul-
dc.date.accessioned2023-04-03T09:23:25Z-
dc.date.available2023-04-03T09:23:25Z-
dc.date.issued2015-06-
dc.identifier.urihttps://link.springer.com/article/10.1007/s13391-015-5129-3-
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/10138-
dc.description.abstractIn-situ RHEED and ex-situ AFM characterizations have been employed to investigate transformations of surface topography with the thickness of PAMBE grown AlGaN and InGaN on GaN. The ternary alloys have been grown with identical growth-front roughness as confirmed by XRR and RHEED observations. The spottier RHEED has been observed with increased thickness of the InGaN as opposed to streakier behavior of AlGaN. We have noticed incremental nature of RMS roughness, skewness and kurtosis of InGaN surface compared to GaN or AlGaN from AFM as evident by final spotty RHEED for InGaN. However, the analyzed fractal dimension is lower for InGaN as opposed to AlGaN (D AlGaN f >D GaN f >D InGaN f ). From the kinetic roughening perspective of adatoms, the experimental evidences lead to the high correlation between binding energy of the cluster atoms (E AlN b >E GaN b >E InN b ) and the modified DDA growth model with dissociation and evaporation to confirm the efficacy of the study. The initial streaky and spotty RHEED of InGaN and AlGaN, respectively, can be attributed to their E b that causes smoothing and roughening of the GaN surface due to adatoms surface mobility behavior. Therefore, the fractal description reveals the fact during formation of nitride hetero-interface while other AFM results describe the top surface.en_US
dc.language.isoenen_US
dc.publisherSpringeren_US
dc.subjectEEEen_US
dc.subjectIII-nitride surfaceen_US
dc.subjectAFMen_US
dc.subjectGrowth modelen_US
dc.subjectHR-XRDen_US
dc.subjectRHEEDen_US
dc.titleEvolution and analysis of nitride surface and interfaces by statistical techniques: A correlation with RHEED through kinetic rougheningen_US
dc.typeArticleen_US
Appears in Collections:Department of Electrical and Electronics Engineering

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