DSpace logo

Please use this identifier to cite or link to this item: http://dspace.bits-pilani.ac.in:8080/jspui/xmlui/handle/123456789/10139
Title: Fowler–Nordheim Tunnelling Contribution in AlGaN/GaN on Si (111) Schottky Current
Authors: Kumar, Rahul
Keywords: EEE
AlGaN/GaN heterostructure
Fowler–Nordheim
Tunnelling
Schottky Barrier
Issue Date: 2016
Publisher: Taylor & Francis
Abstract: AlGaN/GaN heterojunction with Schottky metal contact can be modelled with two back-to-back diodes. The forward-biased diode between metal and AlGaN barrier acts at the onset of current with positive bias. Fowler– Nordheim tunnelling is mainly responsible for the electron transport at the low positive bias level. Downward energy band bending of AlGaN barrier with further positive voltage reduces the tunnelling probability due to lowering of the barrier height of the first diode, causing a dramatic change in the current.
URI: https://www.tandfonline.com/doi/abs/10.1080/02564602.2015.1042933?journalCode=titr20
http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/10139
Appears in Collections:Department of Electrical and Electronics Engineering

Files in This Item:
There are no files associated with this item.


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.