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Please use this identifier to cite or link to this item: http://dspace.bits-pilani.ac.in:8080/jspui/xmlui/handle/123456789/10143
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dc.contributor.authorKumar, Rahul-
dc.date.accessioned2023-04-03T09:37:01Z-
dc.date.available2023-04-03T09:37:01Z-
dc.date.issued2015-01-
dc.identifier.urihttps://www.sciencedirect.com/science/article/pii/S0169433214024210?via%3Dihub-
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/10143-
dc.description.abstractIn this work, compositionally graded In(Al,Ga)As metamorphic buffers (MBs) on GaAs substrate have been grown by MBE through three different paths. A comparative study has been done to comprehend the effect of underlying MB on the constant composition InAlAs healing layer by analyzing the relaxation behaviour, composition and surface morphology of the grown structures. The compositional variation between the constant composition healing layers on top of graded MB has been observed in all three samples although the growth conditions have been kept same. Indium incorporation rate has been found to be dependent on underlying MB. By combining the result of atomic force microscopy, photo-luminescence and X-ray reciprocal space mapping, varying surface roughness has been proposed as the probable driving force behind different Indium incorporation rate.en_US
dc.language.isoenen_US
dc.publisherElsevieren_US
dc.subjectEEEen_US
dc.subjectMolecular beam epitaxy (MBE)en_US
dc.subjectMetamorphic bufferen_US
dc.subjectSurface roughnessen_US
dc.subjectCross hatch patternen_US
dc.subjectRSMen_US
dc.titleComparison of different pathways in metamorphic graded buffers on GaAs substrate: Indium incorporation with surface roughnessen_US
dc.typeArticleen_US
Appears in Collections:Department of Electrical and Electronics Engineering

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