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dc.contributor.authorRao, V. Ramgopal-
dc.date.accessioned2023-10-20T08:48:08Z-
dc.date.available2023-10-20T08:48:08Z-
dc.date.issued2021-05-
dc.identifier.urihttps://ieeexplore.ieee.org/document/9422125-
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12550-
dc.description.abstractIn this article, the power gating (PG) technique is analyzed using nano-electro-mechanical switches (NEMS), FinFETs, and nanowire field-effect transistors (NWFETs). We have used detailed circuit level simulations using well-calibrated models to obtain the conditions for net energy saving with thermal effects. We demonstrate that for a benchmark 17-stage buffer chain circuit, the NEMS PG will be superior to sub-10-nm FinFETs and NWFETs-based gating when the T on / T off ratio is less than 0.1 at room temperature. The ratio increases as temperature increases. Circuit simulations show that the energy gain ( T on / T off = 10 -4 ) due to NEMS gating increases by 3.6 times with reference to NWFETs and 7.3 times as compared to FinFETs-based gating when the temperature increases from 30 °C to 80 °C. NWFETs require a longer breakeven cycle for PG to become more energy-efficient than FinFETs due to its better gate control over the channel.en_US
dc.language.isoenen_US
dc.publisherIEEEen_US
dc.subjectEEEen_US
dc.subjectBerkeley short-channel IGFET model–common multi-gate (BSIM-CMG)en_US
dc.subjectFinFETen_US
dc.subjectNano electro-mechanical switches (NEMS)en_US
dc.subjectPower gating (PG)en_US
dc.titleImpact of Thermal Effects on the Performance of the Power Gating Circuits Using NEMS, FinFETs, and NWFETsen_US
dc.typeArticleen_US
Appears in Collections:Department of Electrical and Electronics Engineering

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