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dc.contributor.authorRao, V. Ramgopal-
dc.date.accessioned2023-10-20T10:05:55Z-
dc.date.available2023-10-20T10:05:55Z-
dc.date.issued2020-06-
dc.identifier.urihttps://ieeexplore.ieee.org/document/9081980-
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12558-
dc.description.abstractHigh performance organic nano-floating gate transistor memory (NFGTM) has important prerequisites of low processing temperature, solution-processable layers and charge trapping medium with high storage capacity. We demonstrate organic NFGTM using black phosphorus quantum dots (BPQDs) as a charge trapping medium by simple spin-coating and low processing temperature (<; 120 °C). The BPQDs with diameter of 12.6 ± 1.5 nm and large quantum confined bandgap of ~ 2.9 eV possess good charge trapping ability. The organic memory device exhibits excellent memory performance with a large memory window of 61.3 V, write-read-erase-read cycling endurance of 10 3 for more than 180 cycles and reliable retention over 10,000 sec. In addition, we successfully improved the memory retention to ON/OFF current ratio > 10 4 over 10,000 sec by introducing PMMA as the tunneling layer.en_US
dc.language.isoenen_US
dc.publisherIEEEen_US
dc.subjectEEEen_US
dc.subjectBlack phosphorusen_US
dc.subjectQuantum dotsen_US
dc.subjectFloating gate transistoren_US
dc.subjectOrganic memoryen_US
dc.subjectSolution-processeden_US
dc.titleNon-Volatile Organic Transistor Memory Based on Black Phosphorus Quantum Dots as Charge Trapping Layeren_US
dc.typeArticleen_US
Appears in Collections:Department of Electrical and Electronics Engineering

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