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Please use this identifier to cite or link to this item: http://dspace.bits-pilani.ac.in:8080/jspui/xmlui/handle/123456789/12674
Title: A Solution Toward the OFF-State Degradation in Drain-Extended MOS Device
Authors: Rao, V. Ramgopal
Keywords: EEE
Band-to-band tunnelling (BTBT)
Drain extended
Drain-extended MOSFET (DeMOS)
Time-dependent dielectric breakdown (TDDB)
Issue Date: Dec-2010
Publisher: IEEE
Abstract: We investigated the surface band-to-band tunnelling (BTBT) current under the off-state condition in drain-extended MOS (DeMOS) devices. We found significant gate-induced drain leakage current due to surface BTBT, which was also reported earlier as the dominant cause of early time-dependent dielectric breakdown and device failure. Furthermore, a layout solution for the existing DeMOS device is proposed in order to mitigate the surface BTBT current and the associated gate oxide reliability issues, without sacrificing the mixed-signal performance of the device.
URI: https://ieeexplore.ieee.org/document/5610723
http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12674
Appears in Collections:Department of Electrical and Electronics Engineering

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