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dc.contributor.authorRao, V. Ramgopal-
dc.date.accessioned2023-10-27T09:24:25Z-
dc.date.available2023-10-27T09:24:25Z-
dc.date.issued2010-12-
dc.identifier.urihttps://ieeexplore.ieee.org/document/5610723-
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12674-
dc.description.abstractWe investigated the surface band-to-band tunnelling (BTBT) current under the off-state condition in drain-extended MOS (DeMOS) devices. We found significant gate-induced drain leakage current due to surface BTBT, which was also reported earlier as the dominant cause of early time-dependent dielectric breakdown and device failure. Furthermore, a layout solution for the existing DeMOS device is proposed in order to mitigate the surface BTBT current and the associated gate oxide reliability issues, without sacrificing the mixed-signal performance of the device.en_US
dc.language.isoenen_US
dc.publisherIEEEen_US
dc.subjectEEEen_US
dc.subjectBand-to-band tunnelling (BTBT)en_US
dc.subjectDrain extendeden_US
dc.subjectDrain-extended MOSFET (DeMOS)en_US
dc.subjectTime-dependent dielectric breakdown (TDDB)en_US
dc.titleA Solution Toward the OFF-State Degradation in Drain-Extended MOS Deviceen_US
dc.typeArticleen_US
Appears in Collections:Department of Electrical and Electronics Engineering

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