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Title: | Chemical Vapor Deposition Precursors for High Dielectric Oxides: Zirconium and Hafnium Oxide |
Authors: | Rao, V. Ramgopal |
Keywords: | EEE CVD precursors Hafnia High dialectric oxides Oxide precursors Zirconia |
Issue Date: | 2009 |
Publisher: | Taylor & Francis |
Abstract: | High dielectric oxides namely ZrO2 and HfO2 have gained a lot of importance as they are candidates in the electronic industry in the form of CMOS technology. A complete review of the literature examples of the precursors employed in the deposition of the thin films of these metal oxides, followed by methodology to design precursors with desirable physicochemical properties have been described in this review article. |
URI: | https://www.tandfonline.com/doi/abs/10.1080/15533170903094964 http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12696 |
Appears in Collections: | Department of Electrical and Electronics Engineering |
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