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Please use this identifier to cite or link to this item: http://dspace.bits-pilani.ac.in:8080/jspui/xmlui/handle/123456789/12713
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dc.contributor.authorRao, V. Ramgopal-
dc.date.accessioned2023-10-30T06:32:15Z-
dc.date.available2023-10-30T06:32:15Z-
dc.date.issued2007-12-
dc.identifier.urihttps://pubs.aip.org/aip/apl/article/91/24/242107/237568/Electret-mechanism-hysteresis-and-ambient-
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12713-
dc.description.abstractThe electret induced hysteresis was studied in sol-gel silica films that result in higher drain currents and improved device performance in pentacene field-effect transistors. Vacuum and ambient condition studies of the hysteresis behavior and capacitance-voltage characteristics on single layer and varying thicknesses of bilayer dielectrics confirmed that blocking layers of thermal oxide could effectively eliminate the electret induced hysteresis, and that thin (25nm) sol-gel silica dielectrics enabled elimination of nanopores thus realizing stable device characteristics under ambient conditions.en_US
dc.language.isoenen_US
dc.publisherIEEEen_US
dc.subjectEEEen_US
dc.subjectHysteresisen_US
dc.subjectDielectricsen_US
dc.subjectElectret mechanismen_US
dc.titleElectret mechanism, hysteresis, and ambient performance of sol-gel silica gate dielectrics in pentacene field-effect transistorsen_US
dc.typeArticleen_US
Appears in Collections:Department of Electrical and Electronics Engineering

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