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Please use this identifier to cite or link to this item: http://dspace.bits-pilani.ac.in:8080/jspui/xmlui/handle/123456789/12766
Title: Electric field tailoring in MBE-grown vertical sub-100 nm MOSFETs
Authors: Rao, V. Ramgopal
Keywords: EEE
MOSFETs
Electric fields
Issue Date: May-1998
Publisher: Elsevier
Abstract: We introduce the concept of electric-field-tailoring in MBE-grown vertical metal-oxide semiconductor field-effect transistors (MOSFETs) and show that significant improvements in terms of supply voltage, current and speed are achievable in such MOSFETs by employing a planar-doped-barrier MOSFET (PDBFET) concept. Investigation of electrical characteristics and carrier transport in sub-100 nm channel PDBFETs shows the predicted improvements compared with classical MOSFETs.
URI: https://www.sciencedirect.com/science/article/abs/pii/S004060909800474X
http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12766
Appears in Collections:Department of Electrical and Electronics Engineering

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