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Please use this identifier to cite or link to this item: http://dspace.bits-pilani.ac.in:8080/jspui/xmlui/handle/123456789/12853
Title: Improving the DC performance of Bulk FinFETs by Optimum Body Doping
Authors: Rao, V. Ramgopal
Keywords: EEE
FinFETs
Doping profiles
Thermal conductivity
Semiconductor process modeling
Guidelines
Quantization
Issue Date: 2007
Publisher: IEEE
Abstract: It is shown that body doping can be used to match the Bulk FinFETs' DC performance with that of SOI FinFETs, even down to 22 nm technology node, by using calibrated full 3D device simulations. However higher body doping does not necessarily mean better performance always as there is a optimum body doping. The optimum doping should be carefully chosen such that device exhibits no punch through and no BTBT leakage currents. Thus careful body doping optimization is critical for the reliable device operation of novel Bulk FinFET structures.
URI: https://ieeexplore.ieee.org/document/4378080
http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12853
Appears in Collections:Department of Electrical and Electronics Engineering

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