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dc.contributor.authorRao, V. Ramgopal-
dc.date.accessioned2023-11-04T04:13:15Z-
dc.date.available2023-11-04T04:13:15Z-
dc.date.issued2006-
dc.identifier.urihttps://ieeexplore.ieee.org/iel5/4017118/4017119/04017204.pdf-
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12858-
dc.description.abstractIn this paper, we investigate the influence of forward and reverse body bias stress on the hot carrier induced degradation of MOS analog performance parameters. The underlying physical mechanisms are identified with the help of experimental results, TCAD and Monte-Carlo simulations. We show that under forward body bias stress conditions, the auger recombination enhanced hot carrier injection (HCI) degrades the device and circuit performance considerably. Degradation in various analog circuits’ performance is quantified by considering the individual transistors under different stress conditions.en_US
dc.language.isoenen_US
dc.publisherIEEEen_US
dc.subjectEEEen_US
dc.subjectAnalog Performance Degradationen_US
dc.subjectSubstrate Enhanced HCIen_US
dc.subjectForward Body Biasing (FBB) Schemeen_US
dc.subjectAuger recombinationen_US
dc.titleAnalog Device and Circuit Performance Degradation under Substrate Enhanced Hot Carrier Stress Conditionsen_US
dc.typeArticleen_US
Appears in Collections:Department of Electrical and Electronics Engineering

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