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Please use this identifier to cite or link to this item: http://dspace.bits-pilani.ac.in:8080/jspui/xmlui/handle/123456789/12885
Title: Optimization of Single Halo p-MOSFET Implant Parameters for Improved Analog Performance and Reliability
Authors: Rao, V. Ramgopal
Keywords: EEE
MOSFET circuits
Implants
Degradation
Current measurement
Analog circuits
Stress measurement
Voltage
Issue Date: Sep-2002
Publisher: IEEE
Abstract: Single halo (SH) MOSFETs are recently proposed for mixed signal applications in view of their superior analog performance such as gain, transconductance, output resistance etc [1]. In this work, we investigate the hot carrier degradation behaviour of SH and conventional p-MOSFETs using specific stress conditions appropriate for analog applications. The degradation of analog device parameters due to Cannel Hot carrier (CHC) stress and its implications on circuit operation are discussed.
URI: https://ieeexplore.ieee.org/abstract/document/1503933
http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12885
Appears in Collections:Department of Electrical and Electronics Engineering

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