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http://dspace.bits-pilani.ac.in:8080/jspui/xmlui/handle/123456789/12899| Title: | Low temperature Hot-Wire CVD nitrides for deep sub-micron CMOS technologies |
| Authors: | Rao, V. Ramgopal |
| Keywords: | EEE HWCVD nitride CMOS technologies |
| Issue Date: | 2000 |
| Publisher: | The International Society for Optical Engineering |
| Abstract: | In this work we report results on MNS capacitors with the silicon nitride films fabricated by using a novel Hot-Wire CVD technique. The dependence of deposition parameters on the film properties is looked into. Our electrical characterisation results on MNS capacitors show good oxide breakdown fields, and low leakage. |
| URI: | http://repository.ias.ac.in/79796/ http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12899 |
| Appears in Collections: | Department of Electrical and Electronics Engineering |
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