Please use this identifier to cite or link to this item:
http://dspace.bits-pilani.ac.in:8080/jspui/handle/123456789/12905| Title: | A Study of the Effect of Plasma Etch Damage on Sub-Micron MOSFET's Flicker Noise Properties |
| Authors: | Rao, V. Ramgopal |
| Keywords: | EEE Plasma properties Plasma applications Plasma measurements Noise measurement Noise figure Plasma devices |
| Issue Date: | Sep-1998 |
| Publisher: | IEEE |
| URI: | https://ieeexplore.ieee.org/document/1503616 http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12905 |
| Appears in Collections: | Department of Electrical and Electronics Engineering |
Files in This Item:
There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.