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Please use this identifier to cite or link to this item: http://dspace.bits-pilani.ac.in:8080/jspui/xmlui/handle/123456789/12905
Title: A Study of the Effect of Plasma Etch Damage on Sub-Micron MOSFET's Flicker Noise Properties
Authors: Rao, V. Ramgopal
Keywords: EEE
Plasma properties
Plasma applications
Plasma measurements
Noise measurement
Noise figure
Plasma devices
Issue Date: Sep-1998
Publisher: IEEE
URI: https://ieeexplore.ieee.org/document/1503616
http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12905
Appears in Collections:Department of Electrical and Electronics Engineering

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