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Please use this identifier to cite or link to this item: http://dspace.bits-pilani.ac.in:8080/jspui/xmlui/handle/123456789/12905
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dc.contributor.authorRao, V. Ramgopal-
dc.date.accessioned2023-11-07T10:58:30Z-
dc.date.available2023-11-07T10:58:30Z-
dc.date.issued1998-09-
dc.identifier.urihttps://ieeexplore.ieee.org/document/1503616-
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12905-
dc.language.isoenen_US
dc.publisherIEEEen_US
dc.subjectEEEen_US
dc.subjectPlasma propertiesen_US
dc.subjectPlasma applicationsen_US
dc.subjectPlasma measurementsen_US
dc.subjectNoise measurementen_US
dc.subjectNoise figureen_US
dc.subjectPlasma devicesen_US
dc.titleA Study of the Effect of Plasma Etch Damage on Sub-Micron MOSFET's Flicker Noise Propertiesen_US
dc.typeArticleen_US
Appears in Collections:Department of Electrical and Electronics Engineering

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