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Please use this identifier to cite or link to this item: http://dspace.bits-pilani.ac.in:8080/jspui/handle/123456789/14388
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dc.contributor.authorSarkar, Niladri-
dc.date.accessioned2024-02-21T03:56:11Z-
dc.date.available2024-02-21T03:56:11Z-
dc.date.issued2021-12-
dc.identifier.urihttps://iopscience.iop.org/article/10.1088/2631-8695/ac3d13/meta-
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/jspui/xmlui/handle/123456789/14388-
dc.description.abstractThis work investigates the effect of defects on the electron density profiles of nanowire FETs with a rectangular cross-section. It also presents a framework for the discretization of the nanowire channels with defects. A self-consistent procedure using Schrodinger-Poisson solver with density matrix formalism calculates the local electron density profiles. The local electron density decreases due to defect-induced scattering potentials. The electron density profiles vary according to the nature of the intrinsic defects. The effect of defect-induced potentials on the output characteristics of the nanowire FET device is studied using the non-equilibrium Green's function (NEGF) methodology. An increase in scattering potential in the nanowire channel causes a considerable decrease in the saturation voltage and current. This results in a faster saturation which changes the overall device performance. Hence, defect-controlled channels can be utilized to fabricate FETs with desired characteristics.en_US
dc.language.isoenen_US
dc.publisherIOPen_US
dc.subjectPhysicsen_US
dc.subjectNanowire FETsen_US
dc.subjectNon-equilibrium Green's function (NEGF)en_US
dc.titleInvestigation of the role of defects on channel density profiles and their effect on the output characteristics of a nanowire FETen_US
dc.typeArticleen_US
Appears in Collections:Department of Physics

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