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dc.contributor.authorGangopadhyay, Subhashis-
dc.date.accessioned2024-03-06T11:12:06Z-
dc.date.available2024-03-06T11:12:06Z-
dc.date.issued2007-04-
dc.identifier.urihttps://pubs.aip.org/avs/jvb/article/25/3/791/468603-
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/jspui/xmlui/handle/123456789/14555-
dc.description.abstractThe morphology and density of InGaN nanoislands can be controlled by the choice of proper growth conditions for metal organic vapor phase epitaxy. Scanning tunneling microscopy has been used to investigate the dependence of InGaN island morphology on the growth parameters. A heterogeneous nucleation of large InGaN islands with a complex structure is observed after growth at in conjunction with a high In partial pressure. For and low In partial pressure, however, the homogeneous nucleation of small islands of sizes suitable for three-dimensional quantum confinement is found, with very high densities of ⁠. The influence of the growth temperature and the In partial pressure is discussed in terms of thermally activated diffusion and surface mobility.en_US
dc.language.isoenen_US
dc.publisherAIPen_US
dc.subjectPhysicsen_US
dc.subjectQuantum confinementen_US
dc.subjectCrystal structureen_US
dc.subjectCrystallographyen_US
dc.subjectMechanical stressen_US
dc.subjectChemical vapor depositionen_US
dc.titleFormation and morphology of InGaN nanoislands on GaN(0001)en_US
dc.typeArticleen_US
Appears in Collections:Department of Physics

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