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Please use this identifier to cite or link to this item: http://dspace.bits-pilani.ac.in:8080/jspui/handle/123456789/18444
Title: Electron beam deposited thin titanium films and its thermal oxidation to form rutile TiO2 thin films
Authors: Gangopadhyay, Subhashis
Keywords: Physics
X-Ray diffraction (XRD)
UV-Vis spectroscopy.
Issue Date: 2024
Publisher: AIP
Abstract: Smooth and homogeneous titanium (Ti) thin films are formed on quartz substrate using a vacuum assisted electron beam evaporation technique. Afterwards, controlled thermal oxidation of these Ti films are performed to grow a uniform titanium dioxide (TiO2) layer. Structural, morphological, chemical and optical properties of these metal and oxide layers have been investigated using various surface characterization techniques such as x-ray diffraction (XRD), scanning electron microscopy (SEM), Raman spectroscopy and UV-Vis spectroscopy. Formation of rutile TiO2 phase is confirmed from the XRD and Raman spectroscopy, after thermal oxidation above 400°C. SEM imaging suggests the formation of a smooth and homogeneous Ti as well as TiO2 layers which appear with a nanometer scale granular surface morphology. All findings are explained in terms of surface thermodynamics and chemical reactivity.
URI: https://pubs.aip.org/aip/acp/article/3149/1/020040/3308557/Electron-beam-deposited-thin-titanium-films-and
http://dspace.bits-pilani.ac.in:8080/jspui/handle/123456789/18444
Appears in Collections:Department of Physics

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