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dc.contributor.authorHibbert, D. Brynn-
dc.contributor.authorSugiarto, Herman-
dc.contributor.authorTseung, Alfred C. C.-
dc.date.accessioned2025-04-29T06:40:25Z-
dc.date.available2025-04-29T06:40:25Z-
dc.date.issued1978-
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/jspui/handle/123456789/18823-
dc.description.abstractThe deposition and dissolution of copper from copper sulphate solutions have been studied by galvanostatic measurements. From current overpotential relations it is concluded that the rate limiting step in the electrochemical reduction or oxidation at pH 1 is the reaction Cu2++ e ⇌ Cu+. In the presence of chloride and sulphite ions, the CuCl–2 complex is formed which stabilises the CuI state. The rate limiting step is now the reduction of this complex. Anodically the slow step is the oxidation of CuCl–2. The addition of sulphite ions chemically reduces CuII to CuI, but the rate is much slower than the electrochemical reduction at an overpotential of –100 mV. At pH 1 chemical dissolution of the copper deposited at the cathode occurs.en_US
dc.language.isoenen_US
dc.publisherJournal of the Chemical Society : Faraday Transaction - I. The Chemical Society, London. 1978, 74 (08)en_US
dc.subjectChemistryen_US
dc.subjectElectrochemical kineticsen_US
dc.subjectChloride mediaen_US
dc.subjectJournal of the Chemical Society : Faraday Transaction - Ien_US
dc.titleChemical and electrochemical kinetics of CuII reduction in chloride mediaen_US
dc.typeArticleen_US
Appears in Collections:Journal Articles (before-1995)

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