Department of Electrical and Electronics Engineering
: [2012]
Collection home page
Collection's Items (Sorted by Submit Date in Descending order): 461 to 480 of 2012
| Issue Date | Title | Author(s) |
| 1999 | 100 nm channel length MNSFETs using a jet vapor deposited ultra-thin silicon nitride gate dielectric | Rao, V. Ramgopal |
| 2000 | Low temperature Hot-Wire CVD nitrides for deep sub-micron CMOS technologies | Rao, V. Ramgopal |
| 2000 | Reliability studies on sub 100 nm SOI-MNSFETs | Rao, V. Ramgopal |
| 2001 | Comparison of Sub-Bandgap Impact Ionization in Deep-Sub-Micron Conventional and Lateral Asymmetrical Channel nMOSFETs | Rao, V. Ramgopal |
| 2000-09 | Drain Bias Dependence of Gate Oxide Reliability in Conventional and Asymmetrical Channel MOSFETs in the Low Voltage Regime | Rao, V. Ramgopal |
| 2001-07 | Multi-Frequency Transconductance Technique for Interface Characterization of Deep Sub-Micron SOI-MOSFETs | Rao, V. Ramgopal |
| 2001 | Effect of Fringing Capacitances in Sub 100 nm MOSFET's with High-K Gate Dielectrics | Rao, V. Ramgopal |
| 2001 | Performance optimization of 60 nm channel length vertical MOSFETs using channel engineering | Rao, V. Ramgopal |
| 2001 | Reliability issues of ultra thin silicon nitride (a-SiN:H) by hot wire CVD for deep sub-micron CMOS technologies | Rao, V. Ramgopal |
| 2001-09 | Study of Degradation in Channel Initiated Secondary Electron Injection Regime | Rao, V. Ramgopal |
| 2001-09 | The Impact of High-K Gate Dielectrics on Sub 100 nm CMOS Circuit Performance | Rao, V. Ramgopal |
| 2001 | High Field Stressing Effects in JVD Nitride Capacitors | Rao, V. Ramgopal |
| 2001-10 | Characterization of lateral asymmetric channel (LAC) thin film SOI MOSFETs | Rao, V. Ramgopal |
| 2002-04 | Simulation Study of Non-Quasi Static Behaviour of MOS Transistors | Rao, V. Ramgopal |
| 2003-04 | Nitrogen dilution effects on structural and electrical properties of hot-wire-deposited a-SiN:H films for deep-sub-micron CMOS technologies | Rao, V. Ramgopal |
| 2002-09 | Optimization of Single Halo p-MOSFET Implant Parameters for Improved Analog Performance and Reliability | Rao, V. Ramgopal |
| 2002-07 | Physical mechanisms for pulsed AC stress degradation in thin gate oxide MOSFETs | Rao, V. Ramgopal |
| 2002 | Suppression of boron penetration by hot wire CVD polysilicon | Rao, V. Ramgopal |
| 2011-02 | Polarity Dependence of Degradation in Ultra Thin Oxide and JVD Nitride Gate Dielectrics | Rao, V. Ramgopal |
| 2011-02 | Device Scaling Effects on Substrate Enhanced Degradation in MOS Transistors | Rao, V. Ramgopal |
Collection's Items (Sorted by Submit Date in Descending order): 461 to 480 of 2012
