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http://dspace.bits-pilani.ac.in:8080/jspui/handle/123456789/20651| Title: | Chemical Vapour Deposition of TiO2 Film Using an Organometallic Process and its Photoelectrochemical Behaviour |
| Authors: | Takahashi, Yasutaka Tsuda, Katsumi Sugiyama, Kohzo |
| Keywords: | Chemistry Chemical vapour deposition Semiconductor photoelectrochemistry Journal of the Chemical Society : Faraday Transaction - I |
| Issue Date: | 1981 |
| Publisher: | Journal of the Chemical Society : Faraday Transaction - I. The Chemical Society, London. 1981, 77 (05) |
| Abstract: | Vapour pyrolysis of ethyl titanate has been performed in order to obtain thin TiO2 films. A selective deposition of rutile films is found to occur when substrate temperatures are below 500°C and the gas phase has a large linear velocity. The physical properties of the as-grown films, including their photoelectrochemical behaviour, are examined in relation to their condition of deposition. A thick rutile film grown on a Ti plate converts light energy to electricity with good quantum efficiency in a photoelectrochemical cell. |
| URI: | http://dspace.bits-pilani.ac.in:8080/jspui/handle/123456789/20651 |
| Appears in Collections: | Journal Articles (before-1995) |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| 1051-1057.pdf Restricted Access | 268.45 kB | Adobe PDF | View/Open Request a copy |
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