Fabrication of single-mode Y-branch waveguides in photosensitive polymer with reduced Y-junction residue

Please use this identifier to cite or link to this item: http://dspace.bits-pilani.ac.in:8080/jspui/handle/123456789/9549

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DC Field	Value	Language
dc.contributor.author	Singhal, Rahul	-
dc.date.accessioned	2023-03-07T05:28:17Z	-
dc.date.available	2023-03-07T05:28:17Z	-
dc.date.issued	2012-11	-
dc.identifier.uri	https://www.sciencedirect.com/science/article/pii/S0030402611005286	-
dc.identifier.uri	http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/9549	-
dc.description.abstract	Single-mode small-core (∼2 μm × 2 μm) Y-branch waveguide structures in photosensitive polymer have been fabricated. Y-branch waveguides are designed by the beam propagation method and Y-branch waveguides are obtained on development after a cross-linkable negative tone epoxy SU-8 2002 polymer is exposed to UV through a photomask. Optical Adhesive NOA 61 is used as under- and over-clad. The fabrication process is optimized to avoid polymer residue at the Y-junction. The average insertion loss obtained for a 7.2 mm 1 × 2 device at chip-level is ∼13 dB at 1550 nm.	en_US
dc.language.iso	en	en_US
dc.publisher	Elsevier	en_US
dc.subject	EEE	en_US
dc.subject	Y-junction residue	en_US
dc.subject	Y-branch waveguide	en_US
dc.subject	Polymer waveguides	en_US
dc.subject	Optical splitter	en_US
dc.title	Fabrication of single-mode Y-branch waveguides in photosensitive polymer with reduced Y-junction residue	en_US
dc.type	Article	en_US
Appears in Collections:	Department of Electrical and Electronics Engineering

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