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Please use this identifier to cite or link to this item: http://dspace.bits-pilani.ac.in:8080/jspui/xmlui/handle/123456789/9550
Title: Fabrication of monomode channel waveguides in photosensitive polymer on optical adhesive
Authors: Singhal, Rahul
Keywords: EEE
Adhesives
Masks
Optical fabrication
Optical losses
Optical polymers
Optical waveguides
Issue Date: Sep-2011
Publisher: SAO/NASA Astrophysics Data System
Abstract: We present fabrication of optical waveguides in a photosensitive polymer. The process to fabricate monomode polymeric channel waveguides using simple direct ultraviolet (UV) photolithography is optimized. Channel waveguides of width ~2 to 2.4 μm and height ~1.8 to 2.2 μm are obtained on development after a crosslinkable negative tone epoxy SU-8 2002 polymer is exposed to UV through a photomask. Norland Optical Adhesive 61 (NOA 61) was used as under- and overclad. The average insertion loss obtained at chip-level is ~11 dB (TE00) and ~12 dB (TM00) for 2-cm waveguide at 1550 nm.
URI: https://ui.adsabs.harvard.edu/abs/2011OptEn..50i4601S/abstract
http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/9550
Appears in Collections:Department of Electrical and Electronics Engineering

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