Please use this identifier to cite or link to this item:
http://dspace.bits-pilani.ac.in:8080/jspui/handle/123456789/9550
Title: | Fabrication of monomode channel waveguides in photosensitive polymer on optical adhesive |
Authors: | Singhal, Rahul |
Keywords: | EEE Adhesives Masks Optical fabrication Optical losses Optical polymers Optical waveguides |
Issue Date: | Sep-2011 |
Publisher: | SAO/NASA Astrophysics Data System |
Abstract: | We present fabrication of optical waveguides in a photosensitive polymer. The process to fabricate monomode polymeric channel waveguides using simple direct ultraviolet (UV) photolithography is optimized. Channel waveguides of width ~2 to 2.4 μm and height ~1.8 to 2.2 μm are obtained on development after a crosslinkable negative tone epoxy SU-8 2002 polymer is exposed to UV through a photomask. Norland Optical Adhesive 61 (NOA 61) was used as under- and overclad. The average insertion loss obtained at chip-level is ~11 dB (TE00) and ~12 dB (TM00) for 2-cm waveguide at 1550 nm. |
URI: | https://ui.adsabs.harvard.edu/abs/2011OptEn..50i4601S/abstract http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/9550 |
Appears in Collections: | Department of Electrical and Electronics Engineering |
Files in This Item:
There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.