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Please use this identifier to cite or link to this item: http://dspace.bits-pilani.ac.in:8080/jspui/handle/123456789/9550
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dc.contributor.authorSinghal, Rahul-
dc.date.accessioned2023-03-07T05:36:01Z-
dc.date.available2023-03-07T05:36:01Z-
dc.date.issued2011-09-
dc.identifier.urihttps://ui.adsabs.harvard.edu/abs/2011OptEn..50i4601S/abstract-
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/9550-
dc.description.abstractWe present fabrication of optical waveguides in a photosensitive polymer. The process to fabricate monomode polymeric channel waveguides using simple direct ultraviolet (UV) photolithography is optimized. Channel waveguides of width ~2 to 2.4 μm and height ~1.8 to 2.2 μm are obtained on development after a crosslinkable negative tone epoxy SU-8 2002 polymer is exposed to UV through a photomask. Norland Optical Adhesive 61 (NOA 61) was used as under- and overclad. The average insertion loss obtained at chip-level is ~11 dB (TE00) and ~12 dB (TM00) for 2-cm waveguide at 1550 nm.en_US
dc.language.isoenen_US
dc.publisherSAO/NASA Astrophysics Data Systemen_US
dc.subjectEEEen_US
dc.subjectAdhesivesen_US
dc.subjectMasksen_US
dc.subjectOptical fabricationen_US
dc.subjectOptical lossesen_US
dc.subjectOptical polymersen_US
dc.subjectOptical waveguidesen_US
dc.titleFabrication of monomode channel waveguides in photosensitive polymer on optical adhesiveen_US
dc.typeArticleen_US
Appears in Collections:Department of Electrical and Electronics Engineering

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