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dc.contributor.authorHazra, Arnab-
dc.date.accessioned2023-03-13T09:48:06Z-
dc.date.available2023-03-13T09:48:06Z-
dc.date.issued2013-12-
dc.identifier.urihttps://ieeexplore.ieee.org/abstract/document/6727683-
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/9675-
dc.description.abstractIn this present investigation nanocrystalline TiO 2 based sensor was developed for low ppm level (10-100) acetone detection. TiO 2 thin film (Thickness: 1 μm) was prepared by solgel technique and deposited on the p-Si substrate (5 Ωcm, (100)) by dip coating method. Film was annealed at 450°C for 3 hours in air environment. XRD and FESEM study confirmed the (101) anatase growth with ~6-9 nm particle size. Pd electrode was deposited on the TiO 2 sensing layer to prepare the Pd/TiO 2 /p-Si Metal-Insulator-Semiconductor (MIS) device structure. A detailed acetone sensor study was performed for this MIS device in the temperature range of 100 to 200°C. Sensor showed a repeatable sensing performance with a appreciably fast response time of 7.7 s at 100°C towards 10 ppm acetone with corresponding recovery time of 13 s at 200°C in 10 ppm acetone. Response magnitude was increased from 3.2% to 6.4% with increasing the acetone concentration from 10 to 100 ppm at 200°C.en_US
dc.language.isoenen_US
dc.publisherIEEEen_US
dc.subjectEEEen_US
dc.subjectNanocrystalline TiO2en_US
dc.subjectMIS deviceen_US
dc.subjectAcetone sensingen_US
dc.subjectLow operating temperatureen_US
dc.titleLow temperature low ppm acetone detection by Pd/TiO2/p-Si Metal-Insulator-Semiconductor devicesen_US
dc.typeArticleen_US
Appears in Collections:Department of Electrical and Electronics Engineering

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