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Please use this identifier to cite or link to this item: http://dspace.bits-pilani.ac.in:8080/jspui/handle/123456789/9731
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dc.contributor.authorChaturvedi, Nitin-
dc.date.accessioned2023-03-15T05:44:48Z-
dc.date.available2023-03-15T05:44:48Z-
dc.date.issued2020-
dc.identifier.urihttps://ieeexplore.ieee.org/document/9342435-
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/9731-
dc.description.abstractOver the past few decades, CMOS scaling has been a key driving factor to achieve faster, cheaper and denser digital systems. However, as the technology scales down, there is an exponential increase in leakage current which poses serious design challenges for low power system. SRAM being the biggest on-chip component, suffers from large static power dissipation which in turn significantly affects the overall performance of the system. In addition to large power consumption, SRAM cell also suffers from half-select disturbance issue which severely degrades the reliability of system. So, to address the aforementioned challenges, we review and compare the various existing SRAM cells in order to select the best SRAM cell design (TFC-9T) which offers advantages of low power and half-select disturbance free operation. To further reduce the static power consumption, we propose to modify the selected TFC-9T SRAM cell using emerging non-volatile magnetic tunnel junction (MTJ).en_US
dc.language.isoenen_US
dc.publisherIEEEen_US
dc.subjectEEEen_US
dc.subjectHalf-select disturbanceen_US
dc.subjectNon-volatile memoryen_US
dc.subjectSpin transfer torque-magnetic random-access memoryen_US
dc.subjectStatic noise marginen_US
dc.subjectStatic Random-Access Memoryen_US
dc.titleDesign of a Low Power 11T-1MTJ Non-Volatile SRAM Cell with Half-Select Free Operationen_US
dc.typeArticleen_US
Appears in Collections:Department of Electrical and Electronics Engineering

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