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Highly Sensitive Acetone Sensor Based on Pd/AlGaN/GaN Resistive Device Grown by Plasma-Assisted Molecular Beam Epitaxy

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dc.contributor.author Kumar, Rahul
dc.date.accessioned 2023-04-03T08:47:38Z
dc.date.available 2023-04-03T08:47:38Z
dc.date.issued 2017-11
dc.identifier.uri https://ieeexplore.ieee.org/document/8038000
dc.identifier.uri http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/10131
dc.description.abstract Highly sensitive acetone sensing performance of Pd/AlGaN/GaN resistive devices in the temperature range of 100 °C-250 °C and in the detection range of 100-1000 ppm was reported. A plasma-assisted molecular beam epitaxy was used to grow the AlGaN/GaN heterostructure on Si (111) substrate. Structural characterization of the grown epilayers was performed through double-crystal X-ray diffraction whereas atomic force microscopy was used to obtain the roughness of the sensing surface. Resistive mode configuration of the sample was tested toward acetone in the detection range of 100-1000 ppm and in the temperature range of 100 °C-250 °C. The optimum temperature was found to be 150 °C with response magnitude ~95% for the acetone concentration of 1000 ppm. The sensor response time and recovery time were found to be in the range of ~18-44 s and ~25-109 s, respectively. The cross-sensitivity of the device with other interfering species such as butanone, benzene, toluene, and xylene attributed to good acetone selectivity of the devices. Acetone sensing as well as current transport of the Pd/AlGaN/GaN devices was illustrated with effect including Langmuir adsorption-desorption kinetics and Schottky barrier height between Pd/AlGaN interfaces. en_US
dc.language.iso en en_US
dc.publisher IEEE en_US
dc.subject EEE en_US
dc.subject Acetone sensor en_US
dc.subject AlGaN/GaN heterostructure en_US
dc.subject Resistive device en_US
dc.subject Sensing mechanism en_US
dc.title Highly Sensitive Acetone Sensor Based on Pd/AlGaN/GaN Resistive Device Grown by Plasma-Assisted Molecular Beam Epitaxy en_US
dc.type Article en_US


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