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Fast Response (7.6s) Acetone Sensing by InGaN/GaN on Si (111) at 373 K

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dc.contributor.author Kumar, Rahul
dc.date.accessioned 2023-04-03T08:49:59Z
dc.date.available 2023-04-03T08:49:59Z
dc.date.issued 2017-03
dc.identifier.uri https://ieeexplore.ieee.org/document/7805266
dc.identifier.uri http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/10132
dc.description.abstract A new and exciting resistive gas sensor based on Ni/InGaN/GaN heterostructure, grown by plasma-assisted molecular beam epitaxy, has been developed to efficiently detect acetone very rapidly at low temperature. Non-rectifying I-V characteristics of epitaxially relaxed InGaN with Ni contact have been revealed at 373 K. An incremental current of 11.74 μA has been found at 373 K with the exposure of 100 ppm of acetone vapor at an operating bias of 0.4 V. Sensitivity has been obtained from transient response curves. Most importantly, very fast response/recovery characteristics with good baseline recovery have been witnessed. The response time and recovery time have been found to be ~7.6-8.4 s and ~4.5-19.1 s. A possible explanation, including Langmuir adsorption-desorption isotherm, has also been discussed. en_US
dc.language.iso en en_US
dc.publisher IEEE en_US
dc.subject EEE en_US
dc.subject Fast response en_US
dc.subject Acetone sensor en_US
dc.subject InGaN/GaN en_US
dc.subject Resistive device en_US
dc.title Fast Response (7.6s) Acetone Sensing by InGaN/GaN on Si (111) at 373 K en_US
dc.type Article en_US


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