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Fowler–Nordheim Tunnelling Contribution in AlGaN/GaN on Si (111) Schottky Current

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dc.contributor.author Kumar, Rahul
dc.date.accessioned 2023-04-03T09:26:06Z
dc.date.available 2023-04-03T09:26:06Z
dc.date.issued 2016
dc.identifier.uri https://www.tandfonline.com/doi/abs/10.1080/02564602.2015.1042933?journalCode=titr20
dc.identifier.uri http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/10139
dc.description.abstract AlGaN/GaN heterojunction with Schottky metal contact can be modelled with two back-to-back diodes. The forward-biased diode between metal and AlGaN barrier acts at the onset of current with positive bias. Fowler– Nordheim tunnelling is mainly responsible for the electron transport at the low positive bias level. Downward energy band bending of AlGaN barrier with further positive voltage reduces the tunnelling probability due to lowering of the barrier height of the first diode, causing a dramatic change in the current. en_US
dc.language.iso en en_US
dc.publisher Taylor & Francis en_US
dc.subject EEE en_US
dc.subject AlGaN/GaN heterostructure en_US
dc.subject Fowler–Nordheim en_US
dc.subject Tunnelling en_US
dc.subject Schottky Barrier en_US
dc.title Fowler–Nordheim Tunnelling Contribution in AlGaN/GaN on Si (111) Schottky Current en_US
dc.type Article en_US


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