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Comprehensive strain and band gap analysis of PA-MBE grown AlGaN/GaN heterostructures on sapphire with ultra thin buffer

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dc.contributor.author Kumar, Rahul
dc.date.accessioned 2023-04-03T09:48:42Z
dc.date.available 2023-04-03T09:48:42Z
dc.date.issued 2014-11
dc.identifier.uri https://aip.scitation.org/doi/10.1063/1.4902090
dc.identifier.uri http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/10144
dc.description.abstract In this work, cluster tool (CT) Plasma Assisted Molecular Beam Epitaxy (PA-MBE) grown AlGaN/GaN heterostructure on c-plane (0 0 0 1) sapphire (Al2O3) were investigated by High Resolution X-ray Diffraction (HRXRD), Room Temperature Raman Spectroscopy (RTRS), and Room Temperature Photoluminescence (RTPL). The effects of strain and doping on GaN and AlGaN layers were investigated thoroughly. The out-of-plane (‘c’) and in-plane (‘a’) lattice parameters were measured from RTRS analysis and as well as reciprocal space mapping (RSM) from HRXRD scan of (002) and (105) plane. The in-plane (out-of plane) strain of the samples were found to be −2.5 × 10−3(1 × 10−3), and −1.7 × 10−3(2 × 10−3) in GaN layer and 5.1 × 10−3 (−3.3 × 10−3), and 8.8 × 10−3(−1.3 × 10−3) in AlGaN layer, respectively. In addition, the band structures of AlGaN/GaN interface were estimated by both theoretical (based on elastic theory) and experimental observations of the RTPL spectrum en_US
dc.language.iso en en_US
dc.publisher AIP en_US
dc.subject EEE en_US
dc.subject Cluster tool (CT) en_US
dc.title Comprehensive strain and band gap analysis of PA-MBE grown AlGaN/GaN heterostructures on sapphire with ultra thin buffer en_US
dc.type Article en_US


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