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A novel ultra-low-power gate overlap tunnel FET (GOTFET) dynamic adder

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dc.contributor.author Vidhyadharan, Sanjay
dc.date.accessioned 2023-04-06T10:22:18Z
dc.date.available 2023-04-06T10:22:18Z
dc.date.issued 2020-03
dc.identifier.uri https://www.tandfonline.com/doi/full/10.1080/00207217.2020.1740800
dc.identifier.uri http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/10223
dc.description.abstract Recent researches have indicated that the gate-overlap tunnel FETs (GOTFETs) exhibit double the on-currentsIon and one-tenth the off-currents Ioff than the equally sized MOSFETs at the same technology node, making them ideal candidates for ultra-low-power VLSI applications. This paper presents a complementary GOTFET (CGOT) based dynamic full adder (DFA), which consumes significantly lower power than conventional CMOS DFAs and operates at double the speed of CMOS DFAs. A conventional DFA designed using GOTFETs instead of MOSFETs exhibits 100 ps (40%) lower & 50 ps (30%) lower delays than CMOS DFA. Furthermore, the CGOT DFA consumes merely 2.6 pW of static power, which is 99% (2 orders) lower than the corresponding CMOS DFA ., Ion, . This paper proposes a novel improved DFA circuit design, which mitigates the dynamic power by eliminating redundant switching activity within the DFA circuit, . The proposed modified DFA topology reduces the total power consumption by 25% than the conventional DFA designs at 50% switching activity. The overall power delay product (PDP) reduces to merely 0.9% of the standard CMOS designs. The total power consumption reduces even further with decreasing switching activity, and the improved CGOT DFA consumes 31% lower total power (at 25% switching activity). en_US
dc.language.iso en en_US
dc.publisher Taylor & Francis en_US
dc.subject EEE en_US
dc.subject Full adder en_US
dc.subject 45 nm CMOS technology en_US
dc.subject Power-delay product (PDP) en_US
dc.subject Nanoscale GOTFET en_US
dc.title A novel ultra-low-power gate overlap tunnel FET (GOTFET) dynamic adder en_US
dc.type Article en_US


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