DSpace Repository

A Novel Drain-Extended FinFET Device for High-Voltage High-Speed Applications

Show simple item record

dc.contributor.author Rao, V. Ramgopal
dc.date.accessioned 2023-10-26T10:08:52Z
dc.date.available 2023-10-26T10:08:52Z
dc.date.issued 2012-10
dc.identifier.uri https://ieeexplore.ieee.org/abstract/document/6269049
dc.identifier.uri http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12647
dc.description.abstract A novel drain-extended FinFET device is proposed in this letter for high-voltage and high-speed applications. A 2 × better R ON versus V BD tradeoff is shown from technology computer-aided design simulations for the proposed device, when compared with a conventional device option. Moreover, a device design and optimization guideline has been provided for the proposed device. en_US
dc.language.iso en en_US
dc.publisher IEEE en_US
dc.subject EEE en_US
dc.subject Drain extended MOSFET (DeMOS) en_US
dc.subject FinFET en_US
dc.subject High voltage (HV) en_US
dc.subject System-on-a-chip (SoC) en_US
dc.title A Novel Drain-Extended FinFET Device for High-Voltage High-Speed Applications en_US
dc.type Article en_US


Files in this item

Files Size Format View

There are no files associated with this item.

This item appears in the following Collection(s)

Show simple item record

Search DSpace


Advanced Search

Browse

My Account