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A new oxide trap-assisted NBTI degradation model

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dc.contributor.author Rao, V. Ramgopal
dc.date.accessioned 2023-10-30T09:58:35Z
dc.date.available 2023-10-30T09:58:35Z
dc.date.issued 2005-09
dc.identifier.uri https://ieeexplore.ieee.org/document/1499000
dc.identifier.uri http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12728
dc.description.abstract Using detailed experimental data, we demonstrate that for the correct interpretation of negative bias temperature instability (NBTI) degradation behavior with stress time, it is essential to include the effect of trapping of hydrogen species in the oxide. A new oxide trap-assisted NBTI degradation model is proposed and shown to fit the experimental data very well. Our proposed model can also be used to explain the recently observed phenomenon of higher NBTI degradation for increasing nitrogen concentration in the oxide. We show from numerical calculations that, for higher nitrogen concentration at the interface, one would expect higher NBTI degradation, as also reported recently. en_US
dc.language.iso en en_US
dc.publisher IEEE en_US
dc.subject EEE en_US
dc.subject Hydrogen diffusion en_US
dc.subject Interface trap generation en_US
dc.subject Negative bias temperature instability (NBTI) en_US
dc.subject Oxide trap en_US
dc.title A new oxide trap-assisted NBTI degradation model en_US
dc.type Article en_US


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