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A Simple and Direct Method for Interface Characterization of OFETs

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dc.contributor.author Rao, V. Ramgopal
dc.date.accessioned 2023-11-03T10:44:43Z
dc.date.available 2023-11-03T10:44:43Z
dc.date.issued 2007
dc.identifier.uri https://ieeexplore.ieee.org/document/4378107?arnumber=4378107&tag=1
dc.identifier.uri http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12852
dc.description.abstract Multi-frequency transconductance technique is successfully applied in this work for the first time for interface characterization of OFETs. Standard charge pumping measurements are used on silicon MOSFETs for the validation of MFT technique. The method is implemented on pentacene as well as the P3HT based OFETs with SiO 2 as the gate dielectric. Our results show interface state densities in the range of 10 12 /cm 2 /eV for both the samples. The P3HT films are also shown to have additional trap centres which respond to frequencies above 100 kHz. Our results therefore clearly indicate that the MFT technique is indeed a highly useful technique for interface characterization of OFETs. en_US
dc.language.iso en en_US
dc.publisher IEEE en_US
dc.subject EEE en_US
dc.subject Organic field effect transistors (OFETs) en_US
dc.subject Dielectric measurements en_US
dc.subject Charge measurement en_US
dc.subject Silicon en_US
dc.subject MOSFETs en_US
dc.subject Pentacene en_US
dc.title A Simple and Direct Method for Interface Characterization of OFETs en_US
dc.type Article en_US


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