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Channel engineering for high speed sub-1.0 V power supply deep sub-micron CMOS

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dc.contributor.author Rao, V. Ramgopal
dc.date.accessioned 2023-11-07T10:30:32Z
dc.date.available 2023-11-07T10:30:32Z
dc.date.issued 1999
dc.identifier.uri https://ieeexplore.ieee.org/document/799344
dc.identifier.uri http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12901
dc.description.abstract The effects of channel engineering on device performance have been extensively investigated. The lateral asymmetric channel (LAC) MOSFETs show significantly higher I/sub dsat/ and g/sub msat/, lower I/sub off/, and superior short-channel performance compared with double-halo (DH) and conventional MOSFETs by effectively utilizing the velocity overshoot effects. It is demonstrated that the device switching speed of the LAC device at V/sub DD/=0.6 V is equivalent to that of a conventional device operated at V/sub DD/=1.5 V. en_US
dc.language.iso en en_US
dc.publisher IEEE en_US
dc.subject EEE en_US
dc.subject Power engineering and energy en_US
dc.subject Power supplies en_US
dc.subject Los Angeles Council en_US
dc.subject MOSFETs en_US
dc.subject DH-HEMTs en_US
dc.subject MOS devices en_US
dc.title Channel engineering for high speed sub-1.0 V power supply deep sub-micron CMOS en_US
dc.type Article en_US


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