A Study of the Effect of Plasma Etch Damage on Sub-Micron MOSFET's Flicker Noise Properties

dc.contributor.author	Rao, V. Ramgopal
dc.date.accessioned	2023-11-07T10:58:30Z
dc.date.available	2023-11-07T10:58:30Z
dc.date.issued	1998-09
dc.identifier.uri	https://ieeexplore.ieee.org/document/1503616
dc.identifier.uri	http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/12905
dc.language.iso	en	en_US
dc.publisher	IEEE	en_US
dc.subject	EEE	en_US
dc.subject	Plasma properties	en_US
dc.subject	Plasma applications	en_US
dc.subject	Plasma measurements	en_US
dc.subject	Noise measurement	en_US
dc.subject	Noise figure	en_US
dc.subject	Plasma devices	en_US
dc.title	A Study of the Effect of Plasma Etch Damage on Sub-Micron MOSFET's Flicker Noise Properties	en_US
dc.type	Article	en_US