DSpace Repository

Influence of surface treatments on nanocrystalline silicon

Show simple item record

dc.contributor.author Dey, Srijata
dc.date.accessioned 2024-03-05T06:28:09Z
dc.date.available 2024-03-05T06:28:09Z
dc.date.issued 2004-03
dc.identifier.uri https://www.sciencedirect.com/science/article/pii/S0040609003015505
dc.identifier.uri http://dspace.bits-pilani.ac.in:8080/jspui/xmlui/handle/123456789/14518
dc.description.abstract Fresh porous silicon (PS) samples show photoluminescence (PL) in visible. After a short dip in water, the PL peak shifts towards blue. However, a short dipping of PS in toluene and pentane does not change PL. The intensity of PL decreases upon exposing PS briefly to acetone. The peak position however, remains unchanged. X-Ray diffraction (XRD) and atomic force microscopy (AFM) show the presence of nanocrystals in PS. After dipping in water, XRD and AFM show structural changes. However, dipping in pentane, toluene and acetone has no effect on the XRD and AFM. Using AFM data, John–Singh model of quantum confinement explain the PL results of PS treated with water, toluene and pentane. However, the changes in PL after acetone treatment cannot be explained within this model. en_US
dc.language.iso en en_US
dc.publisher Elsevier en_US
dc.subject Physics en_US
dc.subject Porous Silicon en_US
dc.subject Photoluminescence en_US
dc.subject Atomic force microscopy (AFM) en_US
dc.title Influence of surface treatments on nanocrystalline silicon en_US
dc.type Article en_US


Files in this item

Files Size Format View

There are no files associated with this item.

This item appears in the following Collection(s)

Show simple item record

Search DSpace


Advanced Search

Browse

My Account