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Formation and morphology of InGaN nanoislands on GaN(0001)

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dc.contributor.author Gangopadhyay, Subhashis
dc.date.accessioned 2024-03-06T11:12:06Z
dc.date.available 2024-03-06T11:12:06Z
dc.date.issued 2007-04
dc.identifier.uri https://pubs.aip.org/avs/jvb/article/25/3/791/468603
dc.identifier.uri http://dspace.bits-pilani.ac.in:8080/jspui/xmlui/handle/123456789/14555
dc.description.abstract The morphology and density of InGaN nanoislands can be controlled by the choice of proper growth conditions for metal organic vapor phase epitaxy. Scanning tunneling microscopy has been used to investigate the dependence of InGaN island morphology on the growth parameters. A heterogeneous nucleation of large InGaN islands with a complex structure is observed after growth at in conjunction with a high In partial pressure. For and low In partial pressure, however, the homogeneous nucleation of small islands of sizes suitable for three-dimensional quantum confinement is found, with very high densities of ⁠. The influence of the growth temperature and the In partial pressure is discussed in terms of thermally activated diffusion and surface mobility. en_US
dc.language.iso en en_US
dc.publisher AIP en_US
dc.subject Physics en_US
dc.subject Quantum confinement en_US
dc.subject Crystal structure en_US
dc.subject Crystallography en_US
dc.subject Mechanical stress en_US
dc.subject Chemical vapor deposition en_US
dc.title Formation and morphology of InGaN nanoislands on GaN(0001) en_US
dc.type Article en_US


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