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Oxidation of Aluminium by Nitrous Oxide in the Temperature Range 323-683 K

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dc.contributor.author Hunt, G L
dc.contributor.author Ritchie, I M
dc.date.accessioned 2025-02-03T06:41:24Z
dc.date.available 2025-02-03T06:41:24Z
dc.date.issued 1972
dc.identifier.uri http://dspace.bits-pilani.ac.in:8080/jspui/handle/123456789/17030
dc.description.abstract This paper describes experiments on the oxidation of evaporated aluminium films by nitrous oxide in the temperature range 323-683 K. The kinetics of the reaction were followed by measuring the rate of increase in resistance of the film as it was consumed by oxidation. Experiments in which an electric field was applied across the growing oxide layer were carried out. The pressure dependence of the reaction was studied by investigating the change in oxidation rate accompanying an abrupt pressure change. The results of all these experiments indicate that the aluminium/nitrous oxide system is very complex, and no single rate determining step is operative over the whole temperature range. Four different regions of growth were identified, and possible reaction mechanisms are considered en_US
dc.language.iso en en_US
dc.publisher Journal of the Chemical Society : Faraday Transaction - I. The Chemical Society, London. 1972, 68 (8) en_US
dc.subject Chemistry en_US
dc.subject Oxidation en_US
dc.subject Aluminium en_US
dc.subject Nitrous Oxide en_US
dc.subject Temperature Range 323-683 K en_US
dc.subject Journal of the Chemical Society : Faraday Transaction - I en_US
dc.title Oxidation of Aluminium by Nitrous Oxide in the Temperature Range 323-683 K en_US
dc.type Article en_US


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