Mechanism of the Kryptonation of Nickel by Film Evaporation

Bodys, J. W. S.; Campbell, Kenneth C.

dc.contributor.author	Bodys, J. W. S.
dc.contributor.author	Campbell, Kenneth C.
dc.date.accessioned	2025-02-19T11:27:53Z
dc.date.available	2025-02-19T11:27:53Z
dc.date.issued	1974
dc.identifier.uri	http://dspace.bits-pilani.ac.in:8080/jspui/handle/123456789/17904
dc.description.abstract	Nickel films have been evaporated in the presence of krypton on to a Pyrex substrate maintained at 77 K, and the variation of the krypton incorporation with metal deposition rate and krypton pressure has been studied. Deposition rates were varied between 13 µg and 4.42 mg min–1 and krypton pressures between 3 × 10–3 and 1.3 Torr (0.4 and 173 N m–2). Krypton uptakes of up to almost 6 atom % have been observed. The results are interpreted in terms of a model based on the concept of cryotrapping.	en_US
dc.language.iso	en	en_US
dc.publisher	Journal of the Chemical Society : Faraday Transaction - I. The Chemical Society, London. 1974, 70 (12)	en_US
dc.subject	Chemistry	en_US
dc.subject	Kryptonation	en_US
dc.subject	Film Evaporation	en_US
dc.subject	Journal of the Chemical Society : Faraday Transaction - I	en_US
dc.title	Mechanism of the Kryptonation of Nickel by Film Evaporation	en_US
dc.type	Article	en_US