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Dissolution and Passivation of Nickel: X-ray Photoelcctron Spectroscopic Study

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dc.contributor.author Dickinson, Thomas
dc.contributor.author Povey, Andrew F.
dc.contributor.author Sherwood, Peter M. A.
dc.date.accessioned 2025-04-09T11:37:10Z
dc.date.available 2025-04-09T11:37:10Z
dc.date.issued 1977
dc.identifier.uri http://dspace.bits-pilani.ac.in:8080/jspui/handle/123456789/18615
dc.description.abstract The presence and nature of surface species formed on a nickel electrode after polarisation in 0.5 mol dm~3 sulphuric acid and 0.5 mol dm-3 sulphuric acid + 0.005 mol dm-3 nickel sulphate has been investigated by X-ray photoelectron spectroscopy. The film produced in the active, prepassive, passive and transpassive regions was studied. Nine different species were detected including two sulphur species. In all cases the electrode was transferred to the spectrometer under nitrogen to minimise air oxidation of the metal or film. The binding energies and intensities of the photoelectron peaks were analysed and showed the presence of NiO and Ni(OH)2. The thickness of the film in the passive and transpassive regions was calculated, assuming a continuous layer, as 10-20 A. en_US
dc.language.iso en en_US
dc.publisher Journal of the Chemical Society : Faraday Transaction - I. The Chemical Society, London. 1977, 73 (2) en_US
dc.subject Chemistry en_US
dc.subject Dissolution en_US
dc.subject X-ray en_US
dc.subject Photoelcctron en_US
dc.subject Journal of the Chemical Society : Faraday Transaction - I en_US
dc.title Dissolution and Passivation of Nickel: X-ray Photoelcctron Spectroscopic Study en_US
dc.type Article en_US


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