Abstract:
Infrared spectra of nitrogen and oxygen adsorbed on high surface area SiO films were investigated at different temperatures and surface coverages. On adsorption of NO at 77 K and at low coverage, decomposition of the molecule takes place with simultaneous oxidation of the surface. At higher coverages N2O is formed. On partially or completely oxidized surface absorptions due to NO dimers are obtained. On adsorption of NO2 at 136, 250, 273 and 300 K on freshly prepared SiO films decomposition of the molecule takes place with formation of NO and here again complexes with the surface are formed which are similar to those obtained when NO is adsorbed.
