Infrared Spectra of NO, N2O, NO2 and Oi Adsorbed on SiO Films

Lubezky, Aviva; Folman, Mordechai

dc.contributor.author	Lubezky, Aviva
dc.contributor.author	Folman, Mordechai
dc.date.accessioned	2025-11-21T10:58:47Z
dc.date.available	2025-11-21T10:58:47Z
dc.date.issued	1978
dc.identifier.uri	http://dspace.bits-pilani.ac.in:8080/jspui/handle/123456789/20179
dc.description.abstract	Infrared spectra of nitrogen and oxygen adsorbed on high surface area SiO films were investigated at different temperatures and surface coverages. On adsorption of NO at 77 K and at low coverage, decomposition of the molecule takes place with simultaneous oxidation of the surface. At higher coverages N2O is formed. On partially or completely oxidized surface absorptions due to NO dimers are obtained. On adsorption of NO2 at 136, 250, 273 and 300 K on freshly prepared SiO films decomposition of the molecule takes place with formation of NO and here again complexes with the surface are formed which are similar to those obtained when NO is adsorbed.	en_US
dc.language.iso	en	en_US
dc.publisher	Journal of the Chemical Society : Faraday Transaction - I. The Chemical Society, London. 1978, 74 (09-12)	en_US
dc.subject	Chemistry	en_US
dc.subject	Infrared spectroscopy	en_US
dc.subject	NO adsorption	en_US
dc.subject	Journal of the Chemical Society : Faraday Transaction - I	en_US
dc.title	Infrared Spectra of NO, N2O, NO2 and Oi Adsorbed on SiO Films	en_US
dc.type	Article	en_US