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Improved photoelectrochemical water oxidation using wurtzite ZnO semiconductors synthesized through simple chemical bath reaction

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dc.contributor.author Pande, Surojit
dc.date.accessioned 2021-11-11T11:19:35Z
dc.date.available 2021-11-11T11:19:35Z
dc.date.issued 2014-09-20
dc.identifier.uri https://www.sciencedirect.com/science/article/pii/S0013468614011943?via%3Dihub
dc.identifier.uri http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/3452
dc.description.abstract In this paper we demonstrate, the drop-casting of chemically synthesized ZnO nanoparticles over ITO coated glass substrate to obtain the good-quality semiconductor thin film. UV-visible absorption spectrum of the ZnO film indicates the direct band gap energy of 3.21 eV. Scanning electron microscopy confirms the presence of small particles of ∼30 nm dimension whereas X-ray diffraction analysis indicates the presence of hexagonal wurtzite ZnO structure. Maximum photoelectrochemical water oxidation current of 440 μA cm−2 has been recorded even at a low overpotential of 0.25 V vs. Ag/AgCl reference electrode under minimum illumination of 35 mW cm−2, when tested in 0.1 M Na2SO4 solutions (pH7). The incident photon to current conversion efficiency (IPCE) and absorbed photon to current conversion efficiency (APCE) measurements reflect high photo-conversion efficiencies as 35% and 65%, respectively, when measured with the semiconductor. Photocatalytic activity of the ZnO semiconductors has been measured spectrophotometrically using aqueous Rhodamine-B solution under same Xe-light irradiation. en_US
dc.language.iso en en_US
dc.publisher Elsiever en_US
dc.subject Chemistry en_US
dc.subject Wurtzite Zinc oxide en_US
dc.subject Chemical bath preparation en_US
dc.subject Drop-cast technique en_US
dc.subject Electron microscopy en_US
dc.subject Electrochemical properties en_US
dc.title Improved photoelectrochemical water oxidation using wurtzite ZnO semiconductors synthesized through simple chemical bath reaction en_US
dc.type Article en_US


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