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Fabrication of single-mode Y-branch waveguides in photosensitive polymer with reduced Y-junction residue

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dc.contributor.author Singhal, Rahul
dc.date.accessioned 2023-03-07T05:28:17Z
dc.date.available 2023-03-07T05:28:17Z
dc.date.issued 2012-11
dc.identifier.uri https://www.sciencedirect.com/science/article/pii/S0030402611005286
dc.identifier.uri http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/9549
dc.description.abstract Single-mode small-core (∼2 μm × 2 μm) Y-branch waveguide structures in photosensitive polymer have been fabricated. Y-branch waveguides are designed by the beam propagation method and Y-branch waveguides are obtained on development after a cross-linkable negative tone epoxy SU-8 2002 polymer is exposed to UV through a photomask. Optical Adhesive NOA 61 is used as under- and over-clad. The fabrication process is optimized to avoid polymer residue at the Y-junction. The average insertion loss obtained for a 7.2 mm 1 × 2 device at chip-level is ∼13 dB at 1550 nm. en_US
dc.language.iso en en_US
dc.publisher Elsevier en_US
dc.subject EEE en_US
dc.subject Y-junction residue en_US
dc.subject Y-branch waveguide en_US
dc.subject Polymer waveguides en_US
dc.subject Optical splitter en_US
dc.title Fabrication of single-mode Y-branch waveguides in photosensitive polymer with reduced Y-junction residue en_US
dc.type Article en_US


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