Fabrication of monomode channel waveguides in photosensitive polymer on optical adhesive

dc.contributor.author	Singhal, Rahul
dc.date.accessioned	2023-03-07T05:36:01Z
dc.date.available	2023-03-07T05:36:01Z
dc.date.issued	2011-09
dc.identifier.uri	https://ui.adsabs.harvard.edu/abs/2011OptEn..50i4601S/abstract
dc.identifier.uri	http://dspace.bits-pilani.ac.in:8080/xmlui/handle/123456789/9550
dc.description.abstract	We present fabrication of optical waveguides in a photosensitive polymer. The process to fabricate monomode polymeric channel waveguides using simple direct ultraviolet (UV) photolithography is optimized. Channel waveguides of width ~2 to 2.4 μm and height ~1.8 to 2.2 μm are obtained on development after a crosslinkable negative tone epoxy SU-8 2002 polymer is exposed to UV through a photomask. Norland Optical Adhesive 61 (NOA 61) was used as under- and overclad. The average insertion loss obtained at chip-level is ~11 dB (TE00) and ~12 dB (TM00) for 2-cm waveguide at 1550 nm.	en_US
dc.language.iso	en	en_US
dc.publisher	SAO/NASA Astrophysics Data System	en_US
dc.subject	EEE	en_US
dc.subject	Adhesives	en_US
dc.subject	Masks	en_US
dc.subject	Optical fabrication	en_US
dc.subject	Optical losses	en_US
dc.subject	Optical polymers	en_US
dc.subject	Optical waveguides	en_US
dc.title	Fabrication of monomode channel waveguides in photosensitive polymer on optical adhesive	en_US
dc.type	Article	en_US