Investigation of the Properties of Plasma Deposited Silicon Nitride Thin Films

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dc.contributor.authorChopra, Siddheshwar
dc.date.accessioned2026-05-06T04:59:58Z
dc.date.available2026-05-06T04:59:58Z
dc.date.issued2010
dc.descriptionUnder the Supervision of Prof. Souri Banerjeeen_US
dc.identifier.urihttp://hdl.handle.net/10603/475974
dc.language.isoenen_US
dc.publisherBITS PILANI, Pilani campusen_US
dc.subjectPhysicsen_US
dc.subjectPlasmaen_US
dc.subjectSilicon Nitrideen_US
dc.subjectThin Filmsen_US
dc.titleInvestigation of the Properties of Plasma Deposited Silicon Nitride Thin Filmsen_US
dc.typeThesisen_US

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