Mechanism of the Kryptonation of Nickel by Film Evaporation

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dc.contributor.authorBodys, J. W. S.
dc.contributor.authorCampbell, Kenneth C.
dc.date.accessioned2025-02-19T11:27:53Z
dc.date.available2025-02-19T11:27:53Z
dc.date.issued1974
dc.description.abstractNickel films have been evaporated in the presence of krypton on to a Pyrex substrate maintained at 77 K, and the variation of the krypton incorporation with metal deposition rate and krypton pressure has been studied. Deposition rates were varied between 13 µg and 4.42 mg min–1 and krypton pressures between 3 × 10–3 and 1.3 Torr (0.4 and 173 N m–2). Krypton uptakes of up to almost 6 atom % have been observed. The results are interpreted in terms of a model based on the concept of cryotrapping.en_US
dc.identifier.urihttp://dspace.bits-pilani.ac.in:8080/jspui/handle/123456789/17904
dc.language.isoenen_US
dc.publisherJournal of the Chemical Society : Faraday Transaction - I. The Chemical Society, London. 1974, 70 (12)en_US
dc.subjectChemistryen_US
dc.subjectKryptonationen_US
dc.subjectFilm Evaporationen_US
dc.subjectJournal of the Chemical Society : Faraday Transaction - Ien_US
dc.titleMechanism of the Kryptonation of Nickel by Film Evaporationen_US
dc.typeArticleen_US

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